![Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride: The Journal of Chemical Physics: Vol 146, No 5 Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride: The Journal of Chemical Physics: Vol 146, No 5](https://aip.scitation.org/action/showOpenGraphArticleImage?doi=10.1063/1.4973310&id=images/medium/1.4973310.figures.online.f1.jpg)
Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride: The Journal of Chemical Physics: Vol 146, No 5
![Aluminium fluoride – the strongest solid Lewis acid: structure and reactivity - Catalysis Science & Technology (RSC Publishing) DOI:10.1039/C6CY02369J Aluminium fluoride – the strongest solid Lewis acid: structure and reactivity - Catalysis Science & Technology (RSC Publishing) DOI:10.1039/C6CY02369J](https://pubs.rsc.org/image/article/2017/CY/c6cy02369j/c6cy02369j-f1_hi-res.gif)
Aluminium fluoride – the strongest solid Lewis acid: structure and reactivity - Catalysis Science & Technology (RSC Publishing) DOI:10.1039/C6CY02369J
![Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes: Journal of Vacuum Science & Technology A: Vol 34, No 3 Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes: Journal of Vacuum Science & Technology A: Vol 34, No 3](https://avs.scitation.org/action/showOpenGraphArticleImage?doi=10.1116/1.4943385&id=images/medium/1.4943385.figures.f1.gif)
Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes: Journal of Vacuum Science & Technology A: Vol 34, No 3
![CVs recorded on tungsten in 1.3NaF-AlF3-Al2O3 melt with various scan... | Download Scientific Diagram CVs recorded on tungsten in 1.3NaF-AlF3-Al2O3 melt with various scan... | Download Scientific Diagram](https://www.researchgate.net/publication/331263084/figure/fig10/AS:962642399203332@1606523241148/CVs-recorded-on-tungsten-in-13NaF-AlF3-Al2O3-melt-with-various-scan-rates-of.png)
CVs recorded on tungsten in 1.3NaF-AlF3-Al2O3 melt with various scan... | Download Scientific Diagram
![Atomic Layer Deposition of AlF3 Using Trimethylaluminum and Hydrogen Fluoride | The Journal of Physical Chemistry C Atomic Layer Deposition of AlF3 Using Trimethylaluminum and Hydrogen Fluoride | The Journal of Physical Chemistry C](https://pubs.acs.org/cms/10.1021/acs.jpcc.5b02625/asset/images/medium/jp-2015-02625x_0003.gif)
Atomic Layer Deposition of AlF3 Using Trimethylaluminum and Hydrogen Fluoride | The Journal of Physical Chemistry C
![Inhibition of AlF3·3H2O Impurity Formation in Ti3C2Tx MXene Synthesis under a Unique CoFx/HCl Etching Environment | ACS Applied Energy Materials Inhibition of AlF3·3H2O Impurity Formation in Ti3C2Tx MXene Synthesis under a Unique CoFx/HCl Etching Environment | ACS Applied Energy Materials](https://pubs.acs.org/cms/10.1021/acsaem.9b01618/asset/images/medium/ae9b01618_0009.gif)
Inhibition of AlF3·3H2O Impurity Formation in Ti3C2Tx MXene Synthesis under a Unique CoFx/HCl Etching Environment | ACS Applied Energy Materials
Atomic Layer Etching of AlF3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride
![The missing hydrate AlF3·6H2O [Al(H2O)6]F3: Ionothermal synthesis, crystal structure and characterization of aluminum fluoride hexahydrate - ScienceDirect The missing hydrate AlF3·6H2O [Al(H2O)6]F3: Ionothermal synthesis, crystal structure and characterization of aluminum fluoride hexahydrate - ScienceDirect](https://ars.els-cdn.com/content/image/1-s2.0-S1293255816303363-gr1.jpg)
The missing hydrate AlF3·6H2O [Al(H2O)6]F3: Ionothermal synthesis, crystal structure and characterization of aluminum fluoride hexahydrate - ScienceDirect
![Hemoglobin content of controls, Al+3, and AlF3-treated mice (Sub-acute,... | Download Scientific Diagram Hemoglobin content of controls, Al+3, and AlF3-treated mice (Sub-acute,... | Download Scientific Diagram](https://www.researchgate.net/publication/308756011/figure/fig8/AS:412057338957833@1475253533993/Hemoglobin-content-of-controls-Al-3-and-AlF3-treated-mice-Sub-acute-Sub-chronic-and.png)
Hemoglobin content of controls, Al+3, and AlF3-treated mice (Sub-acute,... | Download Scientific Diagram
![Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes: Journal of Vacuum Science & Technology A: Vol 34, No 3 Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes: Journal of Vacuum Science & Technology A: Vol 34, No 3](https://avs.scitation.org/action/showOpenGraphArticleImage?doi=10.1116/1.4943385&id=images/medium/1.4943385.figures.f2.gif)
Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes: Journal of Vacuum Science & Technology A: Vol 34, No 3
![Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma | The Journal of Physical Chemistry C Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma | The Journal of Physical Chemistry C](https://pubs.acs.org/cms/10.1021/acs.jpcc.0c10695/asset/images/medium/jp0c10695_0008.gif)
Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma | The Journal of Physical Chemistry C
![Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A Thermodynamic and DFT Study | The Journal of Physical Chemistry C Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A Thermodynamic and DFT Study | The Journal of Physical Chemistry C](https://pubs.acs.org/cms/10.1021/acs.jpcc.2c00158/asset/images/medium/jp2c00158_0001.gif)
Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A Thermodynamic and DFT Study | The Journal of Physical Chemistry C
![Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A Thermodynamic and DFT Study | The Journal of Physical Chemistry C Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A Thermodynamic and DFT Study | The Journal of Physical Chemistry C](https://pubs.acs.org/cms/10.1021/acs.jpcc.2c00158/asset/images/medium/jp2c00158_0003.gif)